US Patent Issued to Lam Research on March 17 for "Photoresist development with organic vapor" (Belgian, American Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,466, issued on March 17, was assigned to Lam Research Corp. (Fremont, Calif.).

"Photoresist development with organic vapor" was invented by Dries Dictus (Kessel-Lo, Belgium), Chenghao Wu (San Jose, Calif.), Eric Calvin Hansen (San Jose, Calif.) and Timothy William Weidman (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Development of resists are useful, for example, to form a patterning mask in the context of high-resolution patterning. Development can be accomplished using an organic vapor such as a carboxylic acid. In some implementations, the organic vapor is trifluoroacetic acid. In some implementations, the organic vapor is h...