ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,712,159, issued on Aug. 18, was assigned to Lam Research Corp. (Fremont, Calif.).

"Systems for controlling plasma density distribution profiles including multi-RF zoned substrate supports" was invented by Juline Shoeb (Fremont, Calif.) and Alexander Miller Paterson (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system includes a substrate support, N RF sources and a controller. The substrate support is arranged in a processing chamber, supports a substrate on an upper surface thereof, and includes: a baseplate made of electrically conductive material and M electrodes disposed in the baseplate. Each of the N RF so...