US Patent Issued to Lam Research on April 7 for "Conformal thermal CVD with controlled film properties and high deposition rate" (Oregon, California, Idaho Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,930, issued on April 7, was assigned to Lam Research Corp. (Fremont, Calif.).

"Conformal thermal CVD with controlled film properties and high deposition rate" was invented by Awnish Gupta (Hillsboro, Ore.), Bart J. Van Schravendijk (Palo Alto, Calif.), Frank Loren Pasquale (Tigard, Ore.), Adrien LaVoie (Newberg, Ore.), Jason Alexander Varnell (Tigard, Ore.), Praneeth Ramasagaram (Boise, Idaho), Joseph R. Abel (West Linn, Ore.), Jennifer Leigh Petraglia (Lake Oswego, Ore.) and Dustin Zachary Austin (Tigard, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatuses for depositing dielectric films into features on semiconductor substr...