ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,051, issued on April 14, was assigned to Lam Research Corp. (Fremont, Calif.).

"Oxidation resistant protective layer in chamber conditioning" was invented by Fengyuan Lai (Sherwood, Ore.), Bo Gong (Sherwood, Ore.), Guangbi Yuan (Beaverton, Ore.), Chen-Hua Hsu (Sherwood, Ore.) and Bhadri Varadarajan (Beaverton, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "In some examples, a method for conditioning a wafer processing chamber comprises setting a pressure in the chamber to a predetermined pressure range, setting a temperature of the chamber to a predetermined temperature, and supplying a process gas mixture to a gas distribution device within t...