US Patent Issued to L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude on March 17 for "Tin-containing precursors for deposition of tin-containing thin films and their corresponding deposition processes" (Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,662, issued on March 17, was assigned to L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude (Paris).

"Tin-containing precursors for deposition of tin-containing thin films and their corresponding deposition processes" was invented by Masato Hirai (Yokosuka, Japan), Sunao Kamimura (Yokosuka, Japan), Ling Yun Jia (Tsukuba, Japan) and Christian Dussarrat (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a tin-containing film on a substrate comprises: exposing the substrate to a vapor or a liquid of a film-forming composition that comprises a tin-containing precursor having the general form...