US Patent Issued to Kuwana Metals on Nov. 3 for "Method for supplying associative gas to semiconductor manufacturing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,047, issued on Nov. 3, was assigned to Kuwana Metals Ltd. (Japan).

"Method for supplying associative gas to semiconductor manufacturing apparatus" was invented by Masato Sugimoto (Mie-ken, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure determines a maximum allowable pressure Pmax(T) at which it is possible to supply associative gas without causing association, on the basis of equilibrium vapor pressure data acquired for the associative gas, and adjusts the pressure and/or temperature of the associative gas such that the measured pressure of the associative gas does not exceed the maximum allowable pressure. The maximum al...