US Patent Issued to KURARAY on March 17 for "Modification method of polyurethane, polyurethane, polishing pad, and modification method of polishing pad" (Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,576,474, issued on March 17, was assigned to KURARAY Co. LTD. (Kurashiki, Japan).

"Modification method of polyurethane, polyurethane, polishing pad, and modification method of polishing pad" was invented by Azusa Oshita (Kurashiki, Japan), Mitsuru Kato (Kurashiki, Japan), Minori Takegoshi (Kurashiki, Japan), Chihiro Okamoto (Kurashiki, Japan) and Shinya Kato (Chiyoda-ku, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A modification method of a polyurethane, including the steps of: preparing a polyurethane having an ethylenically unsaturated bond; and treating the polyurethane with a liquid containing a compound having a conjugated double bond, or...