US Patent Issued to KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY on March 17 for "Fluorine-based polymer with low dielectric constant and fluorine-based polymer composition comprising same" (South Korean Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,339, issued on March 17, was assigned to KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (Daejeon, South Korea).

"Fluorine-based polymer with low dielectric constant and fluorine-based polymer composition comprising same" was invented by Eun-Ho Sohn (Yuseong-gu, South Korea), Won Wook So (Yuseong-gu, South Korea), In Joon Park (Yuseong-gu, South Korea), Bong Jun Chang (Yuseong-gu, South Korea), Hong Suk Kang (Yuseong-gu, South Korea), Ju Hyeon Kim (Yuseong-gu, South Korea), Ji Hoon Baik (Yuseong-gu, South Korea), Sang Goo Lee (Yuseong-gu, South Korea), Hyeon Jun Heo (Yuseong-gu, South Korea), Shin Hong Yook (Yuseong-gu, South Korea), Dong Je Han (Yuseong-gu, South Korea) and Ji Y...