US Patent Issued to KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY on June 23 for "Manufacturing method for graphene film" (South Korean Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,736, issued on June 23, was assigned to KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (Seoul, South Korea).

"Manufacturing method for graphene film" was invented by Seung Hee Han (Seoul, South Korea), Unhyeon Kang (Seoul, South Korea), Eunbi Jeong (Seoul, South Korea), Soeun Ahn (Seoul, South Korea) and Kyoung Ho Jeon (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exemplary embodiment of the present invention can provide a method of manufacturing a graphene film, including preparing a substrate including a carbon layer in a chamber, and forming a graphene layer by forming plasma in the chamber and applying a positive voltage pulse...