US Patent Issued to Korea Institute Of Science And Technology, Inha University Research And Business Foundation on July 28 for "Method for manufacturing multilayer structure" (South Korean Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,692,589, issued on July 28, was assigned to Korea Institute Of Science And Technology (Seoul, South Korea) and Inha University Research And Business Foundation (Incheon, South Korea).

"Method for manufacturing multilayer structure" was invented by Hyung-Jun Kim (Seoul, South Korea), Rino Choi (Seoul, South Korea), Seung-Hwan Kim (Seoul, South Korea) and Daeyoon Baek (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method for manufacturing a multilayer structure. The method for manufacturing the multilayer structure includes providing a substrate in a chamber, providing a target in the chamber, and allowing a target materi...