US Patent Issued to KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY on Feb. 24 for "Polymer film using chemical vapor deposition using sulfur as initiator (sCVD), method of preparing the same and apparatus for preparing the same" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,558,705, issued on Feb. 24, was assigned to KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (South Korea).

"Polymer film using chemical vapor deposition using sulfur as initiator (sCVD), method of preparing the same and apparatus for preparing the same" was invented by Sung Gap Im (Daejeon, South Korea), Doheung Kim (Daejeon, South Korea), Wontae Jang (Daejeon, South Korea) and Keonwoo Choi (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a method of preparing a polymer film using chemical vapor deposition using sulfur as an initiator (sCVD) capable of manufacturing a polymer film through polymeriz...