US Patent Issued to Konica Minolta on July 28 for "Wave motion analysis device, scanning device, wave motion analysis system, wave motion analysis method, and program" (Japanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,694,501, issued on July 28, was assigned to Konica Minolta Inc. (Tokyo).

"Wave motion analysis device, scanning device, wave motion analysis system, wave motion analysis method, and program" was invented by Mizuho Nishi (Kyoto, Japan), Yasuhito Watanabe (Takatsuki, Japan) and Mineo Tsushima (Seika-cho, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wave motion analysis device 100 that detects a defect of an inspection object on the basis of a reflection wave obtained from the inspection object, and includes a multiple reflection area extraction unit 106 that acquires tomographic data generated on the basis of the reflection wave and extracts, fr...