US Patent Issued to Kokusai Electric on Sept. 29 for "Gas supply system, substrate processing apparatus and method of manufacturing semiconductor device" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,751,235, issued on Sept. 29, was assigned to Kokusai Electric Corp. (Tokyo).

"Gas supply system, substrate processing apparatus and method of manufacturing semiconductor device" was invented by Tomonori Shibata (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to the present disclosure, there is provided a technique of a gas supply system including: a plurality of first valves capable of opening and closing one or more flow paths through which one or more fluids that contributes to a processing of a substrate are supplied to a process chamber; a plurality of heating regions in which the plurality of first valves are heated; a heat...