US Patent Issued to KOKUSAI ELECTRIC on Sept. 15 for "Cleaning method, recording medium, and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,734,561, issued on Sept. 15, was assigned to KOKUSAI ELECTRIC Corp. (Tokyo).

"Cleaning method, recording medium, and substrate processing apparatus" was invented by Yuki Yamakado (Toyama, Japan), Katsunori Funaki (Toyama, Japan), Tatsushi Ueda (Toyama, Japan), Yasutoshi Tsubota (Toyama, Japan), Yuichiro Takeshima (Toyama, Japan), Keita Ichimura (Toyama, Japan), Hiroto Igawa (Toyama, Japan) and Hiroki Kishimoto (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a technique that includes modifying a deposited film, which is formed on an inner surface of a reaction container, into a film including an oxide layer and a nitride ...