US Patent Issued to KOKUSAI ELECTRIC on Jan. 20 for "Gas nozzle for a substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. D1,109,711, issued on Jan. 20, was assigned to KOKUSAI ELECTRIC Corp. (Tokyo).

"Gas nozzle for a substrate processing apparatus" was invented by Taketoshi Moriya (Toyama, Japan), Yusaku Okajima (Toyama, Japan) and Mika Urushihara (Toyama, Japan).

The patent was filed on Sept. 5, 2024, under Application No. D/961,397.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1109711&OS=D1109711&RS=D1109711

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