US Patent Issued to Kokusai Electric on April 14 for "Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device and non-transitory computer-readable recording medium" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,052, issued on April 14, was assigned to Kokusai Electric Corp. (Tokyo).

"Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device and non-transitory computer-readable recording medium" was invented by Masanori Sakai (Toyama, Japan), Tsutomu Kato (Toyama, Japan) and Atsuhiko Ashitani (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a technique capable of detoxifying a process gas even when the detoxification apparatus is stopped. According to one aspect thereof, there is provided a substrate processing apparatus including: a reaction tube; a process gas supplier; an exh...