ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,248, issued on Sept. 8, was assigned to KLA Corp. (Milpitas, Calif.).

"System and method for defect detection using a conditional masked autoencoder" was invented by Alex Watras (Mountain View, Calif.), Hawren Fang (San Jose, Calif.), Huan Jin (Dublin, Calif.) and Mohammadreza Ravanfar (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for defect detection includes receiving an optical image of a sample and dividing the received optical image include a plurality of image patches. The method includes generating a masked optical image by selectively masking the image patches based on characterization data. The method includes pr...