ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,027, issued on Sept. 22, was assigned to KLA Corp. (Milpitas, Calif.).
"Methods and systems for model-less, scatterometry based measurements of semiconductor structures" was invented by John Hench (Los Gatos, Calif.), Akshay Krishna (Ann Arbor, Mich.), Christopher Liman (San Jose, Calif.), Jeremy Smith (San Mateo, Calif.), Liang Yin (Fremont, Calif.), Hyowon Park (Milpitas, Calif.), Tianhan Wang (San Jose, Calif.) and Boxue Chen (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for performing model-less measurements of semiconductor structures based on scatterometry measurement data are described herein. Scatterom...