ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,768, issued on Sept. 22, was assigned to KLA Corp. (Milpitas, Calif.).

"Adaptive and robust detection of large defects and image misalignment" was invented by Hucheng Lee (Cupertino, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for detecting defects on a specimen are provided. One method includes generating one or more statistics for each of multiple tiles in difference image frames generated for a job of the images. The method also includes identifying outlier tiles in the multiple tiles based on the statistic(s) generated for each of the multiple tiles. The method further includes determining one or more defect detect...