ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,200, issued on March 24, was assigned to KLA Corp. (Milpitas, Calif.).

"Imaging overlay with mutually coherent oblique illumination" was invented by Andrew V. Hill (Sunriver, Ore.), Vladimir Levinski (Migdal HaEmek, Israel), Daria Negri (Nesher, Israel), Amnon Manassen (Haifa, Israel) and Yonatan Vaknin (Yoqneam Llit, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "An overlay metrology system may include illumination sources configured to generate one or more pairs of mutually coherent illumination beams and illumination optics to direct the pairs of illumination beams to an overlay target at common altitude incidence angles and symmetrically...