US Patent Issued to KLA on March 17 for "Method to calibrate, predict, and control stochastic defects in EUV lithography" (American, South Korean Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,579,631, issued on March 17, was assigned to KLA Corp. (Milpitas, Calif.).

"Method to calibrate, predict, and control stochastic defects in EUV lithography" was invented by Pradeep Vukkadala (Santa Clara, Calif.), Cao Zhang (Ann Arbor, Mich.), Anatoly Burov (Austin, Texas), Guy Parsey (Ann Arbor, Mich.), Kyeongeun Ko (Gyeonggi-do, South Korea), Sergei G. Bakarian (Mountain View, Calif.), Janez Krek (Milan, Mich.), Kunlun Bai (Campbell, Calif.), Craig Higgins (Cedar Park, Calif.), John S. Graves (Austin, Texas), Mark D. Smith (San Jose, Calif.) and John J. Biafore (North Scituate, R.I.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An initial probabilit...