ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,285, issued on March 17, was assigned to KLA Corp. (Milpitas, Calif.).
"Gas flow configurations for semiconductor inspections" was invented by Chunhai Wang (Pleasanton, Calif.), Guoheng Zhao (Palo Alto, Calif.), Anatoly Romanovsky (Palo Alto, Calif.), Yihua Hao (San Jose, Calif.) and Monica Ji (Miliptas, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for inspecting a specimen are provided. One system includes an inspection subsystem configured for directing light to an area on the specimen and for generating output responsive to light from the area on the specimen. The system also includes a first gas flow subsystem confi...