US Patent Issued to KLA on June 30 for "System and method for suppression of tool induced shift in scanning overlay metrology" (Israeli, American Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,327, issued on June 30, was assigned to KLA Corp. (Milpitas, Calif.).

"System and method for suppression of tool induced shift in scanning overlay metrology" was invented by Itay Gdor (Tel-Aviv, Israel), Yuval Lubashevsky (Haifa, Israel), Vladimir Levinski (Nazareth Ilit, Israel), Daria Negri (Nesher, Israel), Alon Yagil (Milpitas, Calif.) and Nickolai Isakovich (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An overlay metrology system and method are disclosed for generating an overlay measurement of an overlay target including cells with structures in reversed orders. The overlay metrology system may include an illumination sub-sy...