US Patent Issued to KLA on July 14 for "Methods and systems for x-ray scatterometry measurements employing a machine learning based electromagnetic response model" (California, Michigan Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,970, issued on July 14, was assigned to KLA Corp. (Milpitas, Calif.).

"Methods and systems for x-ray scatterometry measurements employing a machine learning based electromagnetic response model" was invented by Mohsen Mahvash (San Jose, Calif.), John J. Hench (Los Gatos, Calif.), Samad Jafarzanjani (Ann Arbor, Mich.), Rebecca Shen (Santa Clara, Calif.), Christopher D. Liman (Milpitas, Calif.) and Boxue Chen (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for estimating values of parameters of interest from X-ray scatterometry measurements with reduced computational effort are described herein. Values of parameter...