ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,871, issued on Feb. 24, was assigned to KLA Corp. (Milpitas, Calif.).
"Metrology target for scanning metrology" was invented by Andrew V. Hill (Berkley, Calif.), Amnon Manassen (Haifa, Israel), Gilad Laredo (Haifa, Israel), Yoel Feler (Haifa, Israel), Mark Ghinovker (Yoqneam Ilit, Israel) and Vladimir Levinski (Nazareth Ilit, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology system may include a controller coupled to a scanning metrology tool that images a sample in motion along a scan direction. The controller may receive an image of a metrology target on the sample from the scanning metrology tool, where the metrology target compri...