US Patent Issued to KLA on Aug. 25 for "Scanning diffraction based overlay scatterometry" (Israeli Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,716,837, issued on Aug. 25, was assigned to KLA Corp. (Milpitas, Calif.).

"Scanning diffraction based overlay scatterometry" was invented by Itay Gdor (Tel-Aviv, Israel), Yuval Lubashevsky (Haifa, Israel), Vladimir Levinski (Migdal HaEmek, Israel), Daria Negri (Nesher, Israel) and Nickolai Isakovitch (Tel-Aviv, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes illuminating an overlay target with a plurality of measurement cells. The method further includes receiving time-varying interference signals from a first and second photodetector as an overlay target is scanned along a stage-scan direction by a translation stage when impleme...