ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,787, issued on Aug. 11, was assigned to KLA Corp. (Milpitas, Calif.).
"Single-cell scatterometry overlay with sensitivity calibration" was invented by Mordechy Kot (Migdal Haemek, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology system may receive metrology data for a first set of overlay targets including at least two cells with different intended offsets. The system may further receive metrology data for a second set of overlay targets, where the metrology data for the second set of overlay targets is based on fewer cells than for the first set of overlay targets. The system may further generate sensitivity metrics at locations of...