ALEXANDRIA, Va., June 2 -- United States Patent no. 12,643,084, issued on June 2, was assigned to Katholieke Universiteit Leuven, K.U.Leuven R&D (Leuven, Belgium).
"Patterning device" was invented by Jeroen Lammertyn (Neerijse, Belgium) and Daan Witters (Geetbets, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "A miniaturized, automated method for controlled printing of large arrays of nano- to femtoliter droplets by actively transporting mother droplets over hydrophilic-in-hydrophobic ("HIH") micropatches. The technology uses single or double-plate devices where mother droplets can be actuated and HIH micropatches on one or both plates of the device where the droplets are printed. Due to the selectiv...