ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,753,516, issued on Oct. 6, was assigned to KAO Corp. (Tokyo).
"Production method for etching liquid composition" was invented by Yosuke Kimura (Wakayama, Japan) and Kanji Sato (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "In one aspect, provided is a method for producing an etchant composition that is able to reduce dripping during the filling of a container with the etchant composition.An aspect of the present disclosure relates to a method for producing an etchant composition. The etchant composition is used to etch a metal film that is disposed on a substrate. The method includes filling a container with the etchant composition by using a fill...