US Patent Issued to KAO on Oct. 27 for "Mask sheet, method for manufacturing same, and mask comprising same" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,773,836, issued on Oct. 27, was assigned to KAO Corp. (Tokyo).

"Mask sheet, method for manufacturing same, and mask comprising same" was invented by Tomoyuki Motegi (Ichikai-machi, Japan), Yuta Abe (Utsunomiya, Japan), Ryota Shiiba (Utsunomiya, Japan), Takehiko Uematsu (Oyama, Japan), Hideo Kobayashi (Tokyo) and Yoshihiko Kondo (Utsunomiya, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A sheet (10) for a mask has a first fiber layer (11) and a second fiber layer (12). The second fiber layer (12) has a higher trapping ratio for particles having a particle diameter exceeding 1 micro metre and/or a smaller average fiber diameter than the first fiber...