ALEXANDRIA, Va., April 7 -- United States Patent no. 12,595,568, issued on April 7, was assigned to KAO Corp. (Tokyo).
"Etchant composition" was invented by Yosuke Kimura (Wakayama, Japan) and Shota Okazaki (Wakayama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In one aspect, provided is an etchant composition that is able to reduce etching nonuniformity.An aspect of the present disclosure relates to an etchant composition for etching of a layer to be etched that contains at least one metal. The etchant composition contains an etching inhibitor, an acid including at least a nitric acid, and water and has a pH of 1 or less. The etching inhibitor is at least one nitrogen-containing compound selected f...