US Patent Issued to KANKEN TECHNO on Oct. 27 for "Treatment device for semiconductor manufacturing exhaust gas" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,773,665, issued on Oct. 27, was assigned to KANKEN TECHNO Co. LTD. (Kyoto, Japan).

"Treatment device for semiconductor manufacturing exhaust gas" was invented by Hiroshi Imamura (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A treatment device for semiconductor manufacturing exhaust gas of the present invention includes an inlet scrubber, a gas treatment furnace, and an outlet scrubber. The gas treatment furnace includes an outer cylinder having a main body that includes a gas treatment space formed therein and a gas introduction port drilled in a bottom thereof, an inner cylinder that extends across the gas treatment space such that one e...