US Patent Issued to KALARK NANOSTRUCTURE SCIENCES on Nov. 3 for "Method for tungsten-based thin film deposition via fabrication and decomposition of precursor metastable complexes (molecular species)" (Pennsylvania, New York Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,781,343, issued on Nov. 3, was assigned to KALARK NANOSTRUCTURE SCIENCES INC. (Doylestown, Pa.).

"Method for tungsten-based thin film deposition via fabrication and decomposition of precursor metastable complexes (molecular species)" was invented by Barry C. Arkles (Pipersville, Pa.) and Alain E. Kaloyeros (Slingerlands, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and system are provided for the low temperature deposition of tungsten (W) and W-based thin films through the planned and engineered ex-situ or in-situ creation of vapor phase metastable clusters or metastable complexes to achieve precise film conformality, composition, morphol...