ALEXANDRIA, Va., July 28 -- United States Patent no. 12,692,597, issued on July 28, was assigned to JUSUNG ENGINEERING Co. LTD. (South Korea).

"Thin film deposition method" was invented by Yong Hyun Kim (Gwangju-Si, South Korea), Il Houng Park (Gwangju-Si, South Korea), Chang Kyun Park (Gwangju-Si, South Korea), Won Ju Oh (Gwangju-Si, South Korea), Dong Hwan Lee (Gwangju-Si, South Korea), Yong Hyun Lee (Gwangju-Si, South Korea), Jun Seok Lee (Gwangju-Si, South Korea), Byung Gwan Lim (Gwangju-Si, South Korea) and Chul Joo Hwang (Gwangju-Si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method for depositing a thin film, which is performed to deposit a thin film on a substrate. A met...