US Patent Issued to JSR on June 2 for "Method for manufacturing abrasive grains, composition for chemical mechanical polishing, and method for chemical mechanical polishing" (Japanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,644,015, issued on June 2, was assigned to JSR Corp. (Tokyo).

"Method for manufacturing abrasive grains, composition for chemical mechanical polishing, and method for chemical mechanical polishing" was invented by Takanori Yanagi (Tokyo), Pengyu Wang (Tokyo), Kouji Nakanishi (Tokyo), Yuuya Yamada (Tokyo) and Atsushi Baba (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are abrasive grains and a composition for chemical mechanical polishing which are for selectively polishing a silicon nitride film, and which are applicable not only to silicon oxide films but also to amorphous silicon films and polysilicon films. This method for manufacturin...