US Patent Issued to JNC on March 3 for "Siloxane polymer, siloxane polymer composition, and molded article" (Japanese Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,565,586, issued on March 3, was assigned to JNC Corp. (Tokyo).

"Siloxane polymer, siloxane polymer composition, and molded article" was invented by Nobuo Enoki (Chiba, Japan), Kazuya Suwa (Chiba, Japan), Ayaka Kiya (Chiba, Japan), Mikio Yamahiro (Chiba, Japan), Takeshi Matsushita (Chiba, Japan), Taro Ishikawa (Chiba, Japan) and Hisao Oikawa (Chiba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A siloxane polymer contains a silsesquioxane unit and a linear siloxane unit in its main chain and has a cage-type silsesquioxane structure in its side chain. A highly transparent and flexible film having a small linear thermal expansion coefficient is prod...