ALEXANDRIA, Va., March 17 -- United States Patent no. 12,581,890, issued on March 17, was assigned to Jink Solar Co. Ltd. (Jiangxi, China) and Zhejiang Jinko Solar Co. Ltd. (Haining, China).
"Silicon wafer, preparation method of silicon wafer, and passivation treatment solution" was invented by Jiangtao Guo (Haining, China), Yongbing Xu (Haining, China), Liang Liu (Haining, China) and Xinyang Chen (Haining, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "A silicon wafer, a preparation method of the silicon wafer, and a passivation treatment solution is disclosed. The preparation method of the silicon wafer can include the following steps: providing a solar silicon ingot; cutting the solar silicon ingot ...