ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,353, issued on Sept. 1, was assigned to International Business Machines Corp. (Armonk, N.Y.).
"Optimal scanner maps and field layouts" was invented by Allen Gabor (Katonah, N.Y.), Richard C. Johnson (Selkirk, N.Y.), Romain Lallement (Troy, N.Y.) and Daniel Schmidt (Niskayuna, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A photographic lithography method for printing chip sections of a mask to a wafer is provided. The method includes generating the mask including a pattern of rows of the chip sections, each alternating row including half-fields mirrored with respect to corresponding half-fields of an adjacent row, exposing every other row of h...