US Patent Issued to International Business Machines on May 26 for "Backside contact that reduces risk of contact to gate short" (New York, Vermont Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,641,842, issued on May 26, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Backside contact that reduces risk of contact to gate short" was invented by Ruilong Xie (Niskayuna, N.Y.), Shogo Mochizuki (Mechanicville, N.Y.), Daniel Charles Edelstein (White Plains, N.Y.), Lawrence A. Clevenger (Saratoga Springs, N.Y.), Brent A. Anderson (Jericho, Vt.), Kisik Choi (Watervliet, N.Y.), Chanro Park (Clifton Park, N.Y.), Christian Lavoie (Pleasantville, N.Y.), Cornelius Brown Peethala (Slingerlands, N.Y.) and Son Nguyen (Schenectady, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the invention include a transistor compri...