US Patent Issued to International Business Machines on March 31 for "Self-aligned backside contact with increased contact area" (New York Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,593,468, issued on March 31, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Self-aligned backside contact with increased contact area" was invented by Ruilong Xie (Niskayuna, N.Y.), Kisik Choi (Watervliet, N.Y.), Junli Wang (Slingerlands, N.Y.), Somnath Ghosh (Clifton Park, N.Y.), Julien Frougier (Albany, N.Y.), Min Gyu Sung (Latham, N.Y.), Theodorus E. Standaert (Clifton Park, N.Y.), Nicolas Jean Loubet (Guilderland, N.Y.) and Huiming Bu (Glenmont, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A first source drain region adjacent to a first transistor, a second source drain region adjacent to a second transistor, an upper...