ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,261, issued on March 24, was assigned to INTERNATIONAL BUSINESS MACHINES Corp. (Armonk, N.Y.).
"Selective deposition on metals using porous low-k materials" was invented by Krystelle Lionti (San Jose, Calif.), Rudy J. Wojtecki (San Jose, Calif.), Noel Arellano (Gilroy, Calif.), Son Nguyen (Schenectady, N.Y.), Hosadurga Shobha (Niskayuna, N.Y.) and Balasubramanian Pranatharthiharan (Santa Clara, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method is presented for selective deposition on metals using porous low-k materials. The method includes forming alternating layers of a porous dielectric material and a first conductive material, formi...