US Patent Issued to International Business Machines on Aug. 4 for "Method and structure to form connector tabs in subtractive patterning" (New York Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,701,941, issued on Aug. 4, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Method and structure to form connector tabs in subtractive patterning" was invented by Chanro Park (Clifton Park, N.Y.), Koichi Motoyama (Clifton Park, N.Y.), Hsueh-Chung Chen (Cohoes, N.Y.) and Yann Mignot (Slingerlands, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrative patterning process is provided that forms an interconnect structure including a connector tab located between two adjacent electrically conductive line structures. The connector tab and the two adjacent electrically conductive line structures are of unitary construction and a...