US Patent Issued to International Business Machines on Aug. 25 for "Resistor structure in integrated circuit" (New York, Vermont Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,777, issued on Aug. 25, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Resistor structure in integrated circuit" was invented by Huimei Zhou (Albany, N.Y.), Baozhen Li (South Burlington, Vt.), Chih-Chao Yang (Glenmont, N.Y.) and Ashim Dutta (Clifton Park, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of present invention provide a resistor structure. The resistor structure includes a first layer of electrically insulating material; and a second layer of resistive material directly adjacent to the first layer, wherein thermal conductivity of the first layer is equal to or larger than 100 W/m/K. In one embodim...