US Patent Issued to International Business Machines on Aug. 11 for "Co-integration of gate-all-around nanosheet logic device and precision mol resistor" (New York, California Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,656, issued on Aug. 11, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Co-integration of gate-all-around nanosheet logic device and precision mol resistor" was invented by Julien Frougier (Albany, N.Y.), Sagarika Mukesh (Albany, N.Y.), Anthony I. Chou (Guilderland, N.Y.), Andrew M. Greene (Slingerlands, N.Y.), Ruilong Xie (Niskayuna, N.Y.), Nicolas Jean Loubet (Guilderland, N.Y.), Veeraraghavan S. Basker (Fremont, Calif.), Junli Wang (Slingerlands, N.Y.), Effendi Leobandung (Stormville, N.Y.) and Jingyun Zhang (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure that includes a nanosheet logi...