ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,510, issued on April 14, was assigned to International Business Machines Corp. (Armonk, N.Y.).
"Contact jumper for non-self aligned contact devices" was invented by Ruilong Xie (Niskayuna, N.Y.), Julien Frougier (Albany, N.Y.), Min Gyu Sung (Latham, N.Y.) and Heng Wu (Santa Clara, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes a first source/drain contact disposed between a first gate structure and a second gate structure, a dielectric cap disposed on the first source/drain contact, and a first gate contact disposed over the dielectric cap. The first gate contact connects the first gate structure with the s...