ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,478, issued on Sept. 8, was assigned to Intel Corp. (Santa Clara, Calif.).
"Selective bottomless graphene lined interconnects" was invented by Nita Chandrasekhar (Portland, Ore.), Vishal Tiwari (Hillsboro, Ore.) and AKM Shaestagir Chowdhury (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments disclosed herein include integrated circuit structures and methods of forming such structures. In an embodiment, an integrated circuit structure comprises a dielectric layer with a first surface and a second surface, and an opening through the dielectric layer. In an embodiment, the opening is defined by sidewalls. In an embodiment, a grap...