US Patent Issued to Intel on Sept. 8 for "Etch stop layer for backside processing architecture" (Oregon, California Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,482, issued on Sept. 8, was assigned to Intel Corp. (Santa Clara, Calif.).

"Etch stop layer for backside processing architecture" was invented by Anand Murthy (Portland, Ore.), Prashant Majhi (San Jose, Calif.) and Prahalad Parthangal (Beaverton, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An integrated circuit structure includes a first layer comprising silicon and at least one of carbon, oxygen, or hydrogen, and a device layer including a plurality of transistors above the first layer. A first interconnect structure is above the device layer and includes first conductive interconnect features. A second interconnect structure is below the f...