US Patent Issued to Intel on Nov. 3 for "Gate cut, with asymmetrical channel to gate cut spacing" (Oregon Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,422, issued on Nov. 3, was assigned to Intel Corp. (Santa Clara, Calif.).

"Gate cut, with asymmetrical channel to gate cut spacing" was invented by Sukru Yemenicioglu (Portland, Ore.), Leonard P. Guler (Hillsboro, Ore.), Tahir Ghani (Portland, Ore.), Marni Nabors (Portland, Ore.) and Xinning Wang (Hillsboro, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An integrated circuit includes a first device and a laterally adjacent second device. The first device includes a first body including semiconductor material extending from a first source region to a first drain region, and a first gate structure on the first body. The second device includes a s...