ALEXANDRIA, Va., March 3 -- United States Patent no. 12,567,138, issued on March 3, was assigned to Intel Corp. (Santa Clara, Calif.).

"Registration metrology tool using darkfield and phase contrast imaging" was invented by Deepan Kishore Kumar (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure is directed to an inspection system for registration metrology and defect detection using darkfield and phase contrast imaging optical systems. The present system includes a transmitted light mode and diffracted light mode to enable imaging of low contrast features on blank EUV masks and semiconductor wafers. In an aspect, this system combines the optics for darkfield and phase con...