US Patent Issued to Intel on Aug. 25 for "Integrated circuit structures having gate cut plug removed from trench contact using angled directional etch" (Oregon Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,854, issued on Aug. 25, was assigned to Intel Corp. (Santa Clara, Calif.).

"Integrated circuit structures having gate cut plug removed from trench contact using angled directional etch" was invented by Leonard P. Guler (Hillsboro, Ore.), Ala Alazizi (Portland, Ore.) and Tsuan-Chung Chang (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Integrated circuit structures having gate cut plugs removed from trench contacts, and methods of fabricating integrated circuit structures having gate cut plugs removed from trench contacts, are described. For example, an integrated circuit structure includes a vertical stack of horizontal nanowires. A g...